Location History:
- South Burlington, VT (US) (2004 - 2006)
- Pleasant Valley, NY (US) (2005 - 2009)
Company Filing History:
Years Active: 2004-2009
Title: Innovations of Matthew C Nicholls
Introduction
Matthew C Nicholls is a prominent inventor based in Pleasant Valley, NY (US). He has made significant contributions to the field of photolithography and semiconductor technology. With a total of 9 patents to his name, Nicholls has demonstrated a commitment to advancing innovation in his industry.
Latest Patents
One of his latest patents is the "Overlay and CD process window structure." This invention provides a photolithographic device and method for determining the photolithography process window. The device includes a substrate and a pattern layer with both radiant energy transparent and blocking portions. The method allows users to determine the lithographic process window for critical dimensions and overlay on a single chip using electrical test structures. Another notable patent is the "HDP-based ILD capping layer." This invention features a cap nitride stack that prevents etch penetration to the HDP nitride while maintaining the electromigration benefits of HDP nitride atop copper. The stack comprises a first layer of HDP nitride and a second layer of a Si-C-H compound, which is selected for its high selectivity during via RIE.
Career Highlights
Matthew C Nicholls has built a successful career at International Business Machines Corporation (IBM). His work has focused on enhancing photolithography processes and improving semiconductor manufacturing techniques. His innovative approaches have contributed to the efficiency and effectiveness of these processes.
Collaborations
Nicholls has collaborated with notable coworkers, including Timothy C Milmore and Yun-Yu Wang. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Matthew C Nicholls is a distinguished inventor whose work in photolithography and semiconductor technology has led to significant advancements in the field. His contributions through various patents reflect his dedication to innovation and excellence.