The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2004

Filed:

Feb. 20, 2002
Applicant:
Inventors:

Keith J. Machia, Swanton, VT (US);

Matthew C. Nicholls, South Burlington, VT (US);

Charles J. Parrish, Milton, VT (US);

Craig E. Schneider, Underhill, VT (US);

Charles A. Whiting, Milton, VT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/732 ; G03B 2/774 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03B 2/732 ; G03B 2/774 ; G03C 5/00 ;
Abstract

A predictive method is used to compensate for intermediate batch sensitivities which inevitably occur during resist batch changeover. The compensation is applied to historical dose levels to arrive at a new dose level estimating an optimum dose. When the system discovers that a new batch of resist is loaded to a tool, historical data is used to calculate a reference dose for each tool. A batch factor is continuously calculated and using historical data along with the batch factor, a dose adjustment is made to maintain proper image size.


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