Masatoshi Fukuda

Title: Masatoshi Fukuda: Innovator in Semiconductor Technology

Introduction

Masatoshi Fukuda is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His innovative approaches have paved the way for advancements in semiconductor device manufacturing.

Latest Patents

Fukuda's latest patents include a method of manufacturing semiconductor devices. This method involves a hard mask formed above a gate film, which is patterned with a first mask pattern. The patterned hard mask film is then processed into a gate pattern using a second mask pattern. The gate film is patterned with the hard mask film as a mask, followed by the formation of a spacer insulating film. A third mask pattern is created to cover the edges of the gate pattern above the spacer insulating film. The spacer insulating film is etched using the third mask pattern as a mask, resulting in a sidewall insulating film formed on the side walls of the gate film, while leaving the spacer insulating film in the region of the edge of the gate pattern. Another notable patent is for a semiconductor device and its manufacturing method, which includes a semiconductor substrate, a first transistor with a source/drain region and a gate electrode, an insulating film covering the source/drain region and gate electrode, and a first contact plug connected to the source/drain region or gate electrode.

Career Highlights

Fukuda has worked with notable companies such as Fujitsu Corporation and Fujitsu Semiconductor Limited. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Some of his coworkers include Masaki Ishidao and Masahiro Kobayashi. Their collaboration has likely fostered a creative environment that encourages innovation in their projects.

Conclusion

Masatoshi Fukuda's contributions to semiconductor technology through his patents and career achievements highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor device manufacturing.