Tokyo, Japan

Masato Yamada

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignees: Shin-Etsu Handotai, Ltd., Shin-Etsu Chemical Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Yamada. Retrieved from https://idiyas.com/inventor/masato-yamada-o2ktoez8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Masato Yamada - Innovator in Ultraviolet Ray Emission Technology.

Introduction

Masato Yamada is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of ultraviolet ray emission devices. His innovative work focuses on the manufacturing processes that enhance the quality and cost-effectiveness of these devices.

Latest Patents

Masato Yamada holds a patent for a method for manufacturing an epitaxial wafer for ultraviolet ray emission devices. This patent includes several key components: a method for preparing a supporting substrate composed of gallium nitride, forming a bonding layer, and creating a laminated substrate with a seed crystal layer. The invention aims to produce an inexpensive, high-quality epitaxial wafer, which is crucial for the development of efficient ultraviolet emission devices.

Career Highlights

Yamada is currently employed at Shin-Etsu Handotai, Ltd., where he continues to advance his research and development efforts. His work has been instrumental in improving the manufacturing processes for ultraviolet ray emission devices, contributing to the overall progress in this technological area.

Collaborations

One of his notable collaborators is Keitaro Tsuchiya, with whom he has worked closely on various projects related to ultraviolet ray emission technology.

Conclusion

Masato Yamada's innovative contributions to the field of ultraviolet ray emission devices highlight his expertise and commitment to advancing technology. His patent reflects a significant step forward in manufacturing methods, ensuring the production of high-quality devices at a lower cost.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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