Koshi, Japan

Masataka Gosho

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.4

ph-index = 1


Location History:

  • Koshi, JP (2024)
  • Kumamoto, JP (2024)

Company Filing History:


Years Active: 2024-2025

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6 patents (USPTO):Explore Patents

Title: Masataka Gosho: Innovator in Substrate Processing Technology

Introduction

Masataka Gosho is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 6 patents. His work focuses on developing advanced systems and methods that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Gosho's latest patents include a substrate processing system and a substrate processing method. The substrate processing system features a carry-in/out section for cassettes that hold multiple substrates, a batch processing section for collective processing, and a single-wafer processing section for individual substrate handling. This innovative design allows for improved processing efficiency. Additionally, his substrate processing apparatus is designed for drying substrates by replacing a liquid film with a supercritical fluid, showcasing his commitment to advancing substrate processing technologies.

Career Highlights

Masataka Gosho is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this esteemed organization has allowed him to further develop his innovative ideas and contribute to cutting-edge technologies in substrate processing.

Collaborations

Gosho has collaborated with notable coworkers such as Satoshi Okamura and Tomohito Ura. Their combined expertise has likely played a role in the successful development of his patented technologies.

Conclusion

Masataka Gosho's contributions to substrate processing technology reflect his dedication to innovation and excellence. His patents and work at Tokyo Electron Limited continue to influence the industry positively.

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