This inventor holds 12 USPTO granted patents. Top assignees: Nikon Corporation, Nippon Kogaku K.k.. Active years: 1987-2005.
Location History:
- Setagaya-ku, JP (1998)
- Tokyo, JP (1987 - 2002)
- Machida, JP (1999 - 2005)
Company Filing History:
Years Active: 1987-2005
Title: Masaichi Murakami: Innovator in Scanning Exposure Technology
Introduction
Masaichi Murakami is a prominent inventor based in Machida, Japan. He has made significant contributions to the field of exposure technology, holding a total of 12 patents. His work primarily focuses on methods and systems that enhance the precision and efficiency of pattern exposure in photolithography.
Latest Patents
One of his latest patents is a scanning exposure method and system. This invention aims to smoothly join divided patterns that are adjacent to each other in a synchronous moving direction. When a mask and a substrate are moved in synchronization, the divided patterns are joined and picture-synthesized on the substrate. The invention ensures that when the mask and substrate are moved in synchronization with respect to irradiation with exposing light, the divided patterns of the mask are projected onto the substrate. This allows for a plurality of divided patterns adjacent on the substrate to be joined and exposed, with the divided patterns partially overlapping each other in the synchronous moving direction.
Another notable patent is an exposure device, beam shape setting device, and illuminating area setting device. The objective of this invention is to prevent images of particles from being transferred onto a photosensitive substrate. To achieve this, the exposure device includes an illumination optical system that illuminates a reticle with a beam from an illumination source. This system is equipped with illuminating area setting means, arranged at two locations within the illumination optical system, to set the illuminating area of the beam illuminating the reticle.
Career Highlights
Masaichi Murakami has worked with renowned companies such as Nikon Corporation and Nippon Kogaku K.K. His experience in these organizations has significantly influenced his innovative contributions to the field of photolithography.
Collaborations
Throughout his career, Murakami has collaborated with notable individuals, including Kyoichi Suwa and Hidemi Kawai. These collaborations have further enriched his work and led to advancements in exposure technology.
Conclusion
Masaichi Murakami's innovative work in scanning exposure technology and his contributions to the field through his patents have established him as a key figure in the industry. His inventions continue to influence advancements in photolithography and pattern exposure methods.