The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 1988
Filed:
Mar. 03, 1986
Applicant:
Inventors:
Kyoichi Suwa, Yokohama, JP;
Masaichi Murakami, Tokyo, JP;
Assignee:
Nippon Kogaku K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356401 ; 356372 ; 356389 ; 356397 ;
Abstract
A method of detecting a registration diversion between a mask and a wafer prior to a main exposure. This method detects relative diversions between marks on the wafer and latent images of marks on the mask formed on a photosensitive layer of the wafer. The latent images of the marks on the mask are preliminarily formed on the photosensitive layer of the wafer by an exposure energy beam prior to the main exposure.