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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5920378 B1

PDFFull Text
Date of Patent:
Jul. 06, 1999

Filed:

May. 09, 1997

Projection exposure apparatus

Applicant:
Inventors:

Masaichi Murakami, Machida, JP;

Hiroshi Shirasu, Yokohama, JP;

Tomohide Hamada, Yokohama, JP;

Kazuaki Saiki, Tokyo, JP;

Susumu Mori, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:

Chapman and Cutler

Primary Examiner:

D Rutledge

Int. Cl.
CPC ...
G03B / ; G01B / ;
U.S. Cl.
CPC ...
355 53 ; 355 67 ; 356400 ; 250548 ;
Abstract

A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.

Find Patent Forward Citations

Murakami, Masaichi. (1999). Projection exposure apparatus (U.S. Patent No. 5920378). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5920378

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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