The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Jun. 16, 1999
Applicant:
Inventors:
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/754 ; G03B 2/732 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03B 2/754 ; G03B 2/732 ; G03C 5/00 ;
Abstract
The present invention has an objective to prevent images of particles from being transferred onto a photosensitive substrate, so in order to achieve such an objective, an exposure device of the present invention, which has an illumination optical system for illuminating a reticle having a pattern with a beam from an illumination source so that the pattern is formed on the substrate on exposure to light, is equipped with illuminating area setting means, which are arranged at two locations within the illumination optical system so as to set an illuminating area of the beam illuminating the reticle, and an optical system which places the illuminating area setting means being conjugate to the reticle.