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For the Inventor, By the Inventor

Funabashi, Japan

Noritsugu Hanazaki

This inventor holds 5 USPTO granted patents. Top assignees: Nikon Corporation, Other. Active years: 2001-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noritsugu Hanazaki. Retrieved from https://idiyas.com/inventor/noritsugu-hanazaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 60.0

Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 12(Granted Patents)


Location History:

  • Chiyoda-ku, Tokyo, JP (2001)
  • Tokyo, JP (2001 - 2002)
  • Funabashi, JP (2012 - 2013)

Company Filing History:

goldMedal4 out of 8,995 
 
Nikon Corporation
 patents
silverMedal1 out of 834,513 
Other
 patents

Years Active: 2001-2013

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5 patents (USPTO):Explore Patents
1. 8349525 - Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus (2013-01-08),
2. 8202671 - Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus (2012-06-19),
3. 6356341 - Exposure device, beam shape setting device and illuminating area setting device (2002-03-12),
4. 6325516 - Exposure apparatus and field stop thereof (2001-12-04),
5. 6213607 - Exposure apparatus and field stop thereof (2001-04-10),

Title: Noritsugu Hanazaki: Innovator in Protective Apparatus Technology

Introduction

Noritsugu Hanazaki is a notable inventor based in Funabashi, Japan. He has made significant contributions to the field of protective apparatus technology, holding a total of 5 patents. His work primarily focuses on innovations that enhance the functionality and safety of mask substrates.

Latest Patents

Hanazaki's latest patents include a protective apparatus designed to safeguard a predetermined area of the front surface of a mask substrate. This invention features a pellicle frame that is strategically placed around the circumference of the predetermined area and is bonded to the mask substrate's front surface. Additionally, the pellicle is mounted on the frame to cover an opening, ensuring protection. The design incorporates varying rigidity levels in different portions of the frame, enhancing its structural integrity. Another significant patent involves a protective apparatus that surrounds a predetermined area on a substrate's surface. This apparatus consists of a frame with flexible portions and a thin film that closes an opening formed by the frame, providing effective protection against foreign matter.

Career Highlights

Throughout his career, Hanazaki has worked with prominent companies, including Nikon Corporation. His experience in the industry has allowed him to develop innovative solutions that address complex challenges in mask fabrication and exposure apparatus technology.

Collaborations

Hanazaki has collaborated with esteemed colleagues such as Masamitsu Yanagihara and Tomoyuki Watanabe. These partnerships have contributed to the advancement of his inventions and the overall progress in the field.

Conclusion

Noritsugu Hanazaki's contributions to protective apparatus technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in mask substrate protection, making him a significant figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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