The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8202671 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 19, 2012

Filed:

Mar. 23, 2010
Applicant:

Noritsugu Hanazaki, Funabashi, JP;

Inventor:

Noritsugu Hanazaki, Funabashi, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract

A protective apparatus protects a predetermined area on a surface of a substrate. The protective apparatus includes: a frame portion that includes a pair of flexible portions which are disposed along a first direction and oppose each other, and is connected to the surface of the substrate to surround the predetermined area; and a thin film portion that is stretched across the frame portion to oppose the predetermined area and closes an opening portion formed by the frame portion. An end surface of the flexible portion on the thin film portion side has a curved shape which is concave toward a connecting portion with the substrate.


Find Patent Forward Citations

Hanazaki, Noritsugu. (2012). Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus (U.S. Patent No. 8202671). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8202671

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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