The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2001
Filed:
Nov. 07, 2000
Applicant:
Inventors:
Tomoyuki Watanabe, Chiyoda-ku, Tokyo, JP;
Masamitsu Yanagihara, Chiyoda-ku, Tokyo, JP;
Hideji Goto, Chiyoda-ku, Tokyo, JP;
Noritsugu Hanazaki, Chiyoda-ku, Tokyo, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 2/700 ;
U.S. Cl.
CPC ...
G02B 2/700 ;
Abstract
An exposure apparatus has a field stop, disposed in a position conjugate to the reticle, for regulating an illumination area on the reticle. The field stop is constructed of two aperture members including light shielding portions, rectangular first and second apertures and light reducing portions formed at sides of these apertures. The exposure apparatus also has a drive system for shifting a position of the light reducing portion. and relatively moving the two aperture members during the projection.