Masaichi Eda

Title: Masaichi Eda: Innovator in Semiconductor Technology

Introduction

Masaichi Eda is a notable inventor based in Gresham, Oregon, with a significant contribution to the field of semiconductor technology. He holds a total of seven patents, showcasing his expertise and innovative spirit in this highly technical domain.

Latest Patents

Among his latest patents is a method of forming a semiconductor device. This method involves creating gate trenches in a semiconductor substrate, where a portion of the material between the trenches is narrowed. Another material is then formed on the sidewalls of the narrowed portion, which is substantially resistant to etching by an etchant that affects the material between the trenches. Additionally, source and gate contact openings are formed simultaneously. Another significant patent addresses reduced dry etching lag, detailing a method for forming via structures between two electrically conductive layers. This process includes the formation of a dielectric layer and the use of photoresist layers to create dense and isolated via holes, ensuring electrical continuity between the conductive layers.

Career Highlights

Masaichi Eda has worked with prominent companies in the semiconductor industry, including LSI Logic Corporation and Semiconductor Components Industries, LLC. His experience in these organizations has contributed to his development as an inventor and innovator in semiconductor technologies.

Collaborations

Throughout his career, Eda has collaborated with notable colleagues such as Rongxiang Hu and Philippe Schoenborn. These collaborations have likely enriched his work and contributed to the advancements in semiconductor technology.

Conclusion

Masaichi Eda's contributions to semiconductor technology through his patents and career experiences highlight his role as an influential inventor in the field. His innovative methods continue to impact the industry and pave the way for future advancements.