Osaka, Japan

Masahiko Yanagi

This inventor holds 5 USPTO granted patents and 2 published patent applications. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1992-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiko Yanagi. Retrieved from https://idiyas.com/inventor/masahiko-yanagi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0

Average Co-Inventor Count = 1.2

ph-index = 3

Forward Citations = 42(Granted Patents)


Location History:

  • Nara, JP (1992)
  • Tenri, JP (1994)
  • Kasaoka, JP (2008)
  • Osaka, JP (1994 - 2011)

Company Filing History:


Years Active: 1992-2011

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5 patents (USPTO):Explore Patents

Title: Masahiko Yanagi: Innovator in Semiconductor Technology

Introduction

Masahiko Yanagi is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative approaches have led to advancements in the manufacturing processes of semiconductor devices.

Latest Patents

One of Yanagi's latest patents is a method for producing semiconductor devices that reduces the number of mask steps. This invention is particularly beneficial in CMOS production processes, where gate electrodes are formed in regions for both NMOS and PMOS simultaneously using a common mask pattern. After the formation of the gate electrodes, well, source, and drain regions are created through impurity ion implantations, also utilizing a common mask pattern. This method effectively minimizes the number of mask steps required in the production process.

Another notable patent is related to a semiconductor memory device and its manufacturing method. This process involves providing a gate insulating film on an active region, followed by the deposition of a first conductive film. The method includes creating an opening that extends below the interface between the active region and the gate insulating film, allowing for the placement of a gate electrode. The subsequent steps involve the deposition of insulating films and shaping them into side wall spacers, which facilitate charge retention sections beside the gate electrode.

Career Highlights

Masahiko Yanagi is associated with Sharp Kabushiki Kaisha Corporation, where he has been instrumental in developing innovative semiconductor technologies. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Yanagi has collaborated with notable colleagues, including Masahiro Saitoh and Toshiyuki Tohda. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor field.

Conclusion

Masahiko Yanagi's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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