The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Aug. 25, 2010
Masahiko Yanagi, Osaka, JP;
Masahiko Yanagi, Osaka, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
The invention provides a method for producing a semiconductor device that can reduce the number of mask steps. In a CMOS production process, gate electrodes are formed in regions for forming an NMOS and a PMOS at the same time with a common mask pattern, and after the gate electrodes have been formed, a well, and source and drain regions are formed by impurity ion implantations with a common mask pattern in each region of the NMOS and the PMOS, using the gate electrode as a mask, whereby the number of mask steps is reduced.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile