The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 1992
Filed:
Nov. 14, 1991
Masahiko Yanagi, Nara, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
The present invention provides a process for fabricating a semiconductor device including the steps of: depositing a CVD film by a bias ECRCVD process on a wiring layer having an intended contact region in which a wiring line are made wider than in other regions; coating planarly the CVD film with a resist film; etching the resist film back so as to expose a protuberance of the CVD film formed above the inteded contact region; and etching the protuberance and the CVD film thereunder to open a contact hole down to the intended contact region of the wiring layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile