Masaaki Miyajima

Title: The Innovations of Masaaki Miyajima

Introduction

Masaaki Miyajima is a notable inventor hailing from Kasugai, Japan, recognized for his significant contributions to the field of lithographic processes. With a total of 8 patents to his name, Miyajima has made strides in developing innovative solutions that enhance the efficiency and precision of electron beam exposure techniques.

Latest Patents

Among his latest patents, two stand out for their technological advancements. The first patent pertains to a method for preparing data for hybrid exposure using both electron beam exposure and reticle exposure in the lithographic process. This method involves forming a first plurality of rectangular patterns from a reticle preparing rule and lining an object pattern for reticle exposure. The process further includes extracting a second plurality of rectangular patterns arranged in an N×N matrix and performing violation detecting and correcting treatments based on the distance between these patterns.

The second patent introduces a variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method. This innovative apparatus is designed to create rectangular beams of varying angles, allowing for highly precise exposure on fine line patterns with arbitrary angles within the pattern region. The apparatus features a first slit member and a second slit member, each containing multiple rectangular apertures arranged strategically to maximize the efficacy of the electron beam exposure.

Career Highlights

Masaaki Miyajima has worked with prestigious organizations such as Fujitsu Corporation and Fujitsu VLSI Limited. His experiences in these companies have allowed him to refine his skills and contribute significantly to advancements in semiconductor technology and lithography.

Collaborations

Throughout his career, Miyajima has collaborated with experts in the field, including Hiromi Hoshino and Kazumasa Morishita. These partnerships have fostered a creative environment that has propelled his innovative ideas into practical applications, further benefiting the industry.

Conclusion

Masaaki Miyajima's work exemplifies the spirit of innovation in the realm of lithography and electron beam exposure technologies. His patents not only showcase his technical expertise but also contribute significantly to the evolution of manufacturing processes in electronics. As he continues to develop new solutions, his influence in the field will undoubtedly continue to grow.