The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 1999
Filed:
Nov. 04, 1997
Applicant:
Inventor:
Masaaki Miyajima, Kasugai, JP;
Assignee:
Fujitsu Limited, Kanagawa, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F / ; G06G / ;
U.S. Cl.
CPC ...
700121 ; 700118 ; 700213 ; 2504922 ; 25049222 ; 3955002 ; 39550022 ;
Abstract
Producing an exposure data used for exposing a design pattern data of a semiconductor integrated circuit on an exposure medium. Repetitive exposure pattern data is extracted from the design pattern data as a group of exposure pattern data. The group of exposure pattern data includes plural pieces of the repetitive exposure pattern data. A rearrangement information table, which includes information for placing the plural pieces of repetitive exposure pattern data in a predetermined rearrangement area, is generated. The design pattern data is rearranged based on the rearrangement information table to generate the exposure data.