The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2001
Filed:
Aug. 12, 1998
Applicant:
Inventors:
Masaaki Miyajima, Kasugai, JP;
Yoshio Ito, Kasugai, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 ;
U.S. Cl.
CPC ...
G06K 9/00 ;
Abstract
A computer implemented method and an apparatus for generating exposure data of a layout pattern used to fabricate semiconductor integrated circuits. The layout pattern is first analyzed to determine if it can be modified to one or more predefined patterns without having to segment the layout pattern into rectangular patterns. The layout pattern is then modified to the one or more predefined patterns. The modified pattern is also analyzed to determine if it can be modified into segmental block patterns and if so, it is modified accordingly. Finally, exposure data is generated using the modified segmental block patterns.