The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 1999
Filed:
Jul. 08, 1997
Applicant:
Inventor:
Masaaki Miyajima, Kasugai, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; H01J / ;
U.S. Cl.
CPC ...
355 53 ; 25049223 ; 430-5 ;
Abstract
A mask and a block exposure method for transferring a plurality of patterns of the same shape onto an exposure medium while forming the cross-sectional shape of a beam emitted from a light source into a desired pattern. The mask has at least one basic pattern formed by extracting portions of a common shape from pattern information to be exposed. A plurality of blocks are arranged on the mask. Each block includes a plurality of the basic patterns.