San Diego, CA, United States of America

Mary Edmonds

USPTO Granted Patents = 8 

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2016-2020

where 'Filed Patents' based on already Granted Patents

8 patents (USPTO):

Title: Mary Edmonds: Innovator in Chemical Vapor Deposition Technologies

Introduction

Mary Edmonds is a prominent inventor based in San Diego, California. She has made significant contributions to the field of chemical vapor deposition, holding a total of 8 patents. Her work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among her latest patents is a groundbreaking process for self-limiting and saturating chemical vapor deposition of a silicon bilayer. This invention eliminates the need for plasma or catalysts, preventing undesirable substrate oxidation. The methods described in this patent produce a saturated silicon-oxide film with -OH termination, which enhances substrate surfaces' reactivity towards metal ALD precursors. Another notable patent involves a method for depositing silicon on semiconductor materials, utilizing chlorosilane precursors and atomic hydrogen to form multilayer structures.

Career Highlights

Mary has worked with leading organizations in the industry, including Applied Materials, Inc. and the University of California. Her expertise in chemical vapor deposition has positioned her as a key figure in advancing semiconductor technologies.

Collaborations

Throughout her career, Mary has collaborated with esteemed colleagues such as Andrew C. Kummel and Jessica Sevanne Kachian. These partnerships have further enriched her research and development efforts.

Conclusion

Mary Edmonds is a trailblazer in the field of chemical vapor deposition, with a strong portfolio of patents that reflect her innovative spirit. Her contributions continue to influence the semiconductor industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…