Middletown, DE, United States of America

Marty W DeGroot

This inventor holds 29 USPTO granted patents and 10 published patent applications and 3 EPO patents, primarily in Chemical Mechanical Polishing. Top assignees: Rohm and Haas Electronic Materials Cmp Holdings, Inc., Dow Global Technolgoies LLC, Nitta Haas Inc.. Active years: 2015-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marty W DeGroot. Retrieved from https://idiyas.com/inventor/marty-w-degroot

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 29 

% Patents Active = 86.2

 

Average Co-Inventor Count = 4.2

ph-index = 7

Forward Citations = 202(Granted Patents)


Location History:

  • Midland, MI (US) (2015)
  • Middleton, DE (US) (2018)
  • Middletown, DE (US) (2015 - 2022)

Company Filing History:


Years Active: 2015-2025

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Areas of Expertise:
Chemical Mechanical Polishing
Polishing Pad
Uniformity Improvement
Endpoint Detection
Polyurethane
Multilayer
Substrate Polishing
Photovoltaic Cell
Conditioning Tolerance
Pnictide Compositions
Silicon Wafers
29 patents (USPTO):Explore Patents

Title: Innovations by Marty W. DeGroot: A Pioneer in Chemical Mechanical Polishing

Introduction

Marty W. DeGroot, an esteemed inventor based in Middletown, DE, has made significant contributions to the field of chemical mechanical polishing (CMP). With a remarkable portfolio of 28 patents, DeGroot's inventive work has greatly influenced the semiconductor industry through innovative polishing methods and materials.

Latest Patents

Among his notable patents are the "Methods of Making Chemical Mechanical Polishing Layers Having Improved Uniformity." This invention introduces a methodology for manufacturing CMP layers designed for polishing substrates, particularly semiconductor wafers. It involves creating a composite of liquid-filled microelements with a polymeric shell, which is then classified to enhance uniformity. Additionally, the invention encompasses processes to convert these microelements into gas-filled ones and to combine them with a liquid polymer matrix forming material for optimal results. Another significant patent is focused on the development of a chemical mechanical polishing pad that integrates a unique reaction product of isocyanate terminated urethane prepolymers and a curative system. This innovation ensures enhanced performance in polishing applications.

Career Highlights

Throughout his career, Marty W. DeGroot has worked with several prestigious companies, including Rohm and Haas Electronic Materials CMP Holdings, Inc. and Dow Global Technologies LLC. His extensive experience at these organizations has enabled him to refine his expertise in the development of cutting-edge CMP technologies.

Collaborations

DeGroot's work has also been enriched through collaborations with fellow inventors, including Bainian Qian and Fengji Yeh. These partnerships have led to innovative advancements in CMP technologies and have further solidified his reputation in the field.

Conclusion

Marty W. DeGroot stands out as a visionary inventor in the realm of chemical mechanical polishing. His 28 patents illustrate his commitment to innovation and his role in advancing semiconductor polishing methodologies. As the industry continues to evolve, DeGroot's contributions will undoubtedly play a vital part in shaping its future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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