Martina Hommel

Title: Martina Hommel: Innovator in Integrated Circuit Technology

Introduction

Martina Hommel is a distinguished inventor based in Munich, Germany. She has made significant contributions to the field of integrated circuit technology, holding a total of 8 patents. Her work focuses on innovative methods that enhance the performance and reliability of electronic components.

Latest Patents

Among her latest patents is a groundbreaking invention titled "Long-term heat treated integrated circuit arrangements and methods for producing the same." This patent describes methods in which the barrier material is removed at a via bottom or at a via top area through long-term heat treatment. Concurrently, interconnects are coated with barrier material in a straightforward manner using this heat treatment process. Another notable patent is for a "Process for producing a multifunctional dielectric layer on a substrate." This invention allows for the formation of a multifunctional dielectric layer on a substrate, particularly on exposed metallic strip conductor systems. An additional metal layer is created across the surface of these conductors, which is then partially converted into a nonconducting metal oxide, forming the dielectric layer.

Career Highlights

Martina Hommel is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. Her innovative work has positioned her as a key figure in the development of advanced electronic materials and processes.

Collaborations

Throughout her career, Martina has collaborated with notable colleagues, including Markus Schwerd and Heinrich Koerner. These partnerships have further enriched her research and development efforts.

Conclusion

Martina Hommel's contributions to integrated circuit technology exemplify her commitment to innovation and excellence. Her patents reflect her expertise and dedication to advancing the field of electronics.