Elzach, Germany

Martin Weber

This inventor holds 8 USPTO granted patents. Top assignees: Steag Micro Tech Gmbh, Imec Vzw. Active years: 1999-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Martin Weber. Retrieved from https://idiyas.com/inventor/martin-weber-sjbya007

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 4

Forward Citations = 87(Granted Patents)


Location History:

  • Bad Durheim, DE (1999)
  • Bad Durrheim, DE (1999 - 2000)
  • Elsaor, DE (2001)
  • Elzach, DE (2001 - 2003)
  • Bad Dürrheim, DE (2003)

Company Filing History:


Years Active: 1999-2003

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8 patents (USPTO):Explore Patents

Title: The Innovative Journey of Martin Weber

Introduction

Martin Weber, an accomplished inventor based in Elzach, Germany, has made significant contributions to the field of substrate treatment and drying technologies. With a remarkable portfolio of eight patents, Weber has established himself as a prominent figure in his industry. His inventions showcase a blend of creativity and technical expertise, aimed at enhancing efficiency in semiconductor processing.

Latest Patents

Weber's latest patents demonstrate his innovative approach to substrate treatment. One of his notable inventions is a "Device and method for the treatment of substrates in a fluid container." This device features a fluid container and two substrate transport devices positioned above it. Each transport device serves as a hood, capable of receiving multiple substrates. Remarkably, these devices include substrate support mechanisms that facilitate the locking and releasing of substrates, ensuring a smooth operation. The design enables linear movement, allowing operators to alternate positioning of the substrate transport devices effectively.

Another significant patent addresses the drying of substrates, particularly semiconductor wafers. In his "Method and device for drying substrates," Weber has developed a technique that achieves an exceptionally residue-free drying. By heating the meniscus of the liquid at the interface of the substrate surface during removal, this method optimizes the drying process, which is crucial for semiconductor fabrication.

Career Highlights

Throughout his career, Martin Weber has collaborated with reputable organizations, such as Steag Micro Tech GmbH and Imec Vzw. His experiences in these companies have significantly influenced his innovative capabilities and have provided him with the platform to develop his groundbreaking inventions.

Collaborations

Weber has worked alongside distinguished professionals such as John Oshinowo and Klaus Conrad Wolke. These collaborations have fostered an environment of shared knowledge and expertise that has further fueled his inventive spirit and led to many advancements in substrate processing technologies.

Conclusion

Martin Weber's journey as an inventor exemplifies the power of innovation in driving progress within the semiconductor industry. His eight patents reflect a commitment to improving substrate treatment and drying methods, impacting the efficiency and effectiveness of semiconductor manufacturing processes. With his continued contribution, Weber is set to inspire future inventors and advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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