Steag Micro Tech Gmbh

Imec Vzw

Martin Weber

John Oshinowo

Klaus Conrad Wolke

Marc A Meuris

Dieter Meister

Jurgen Funkhanel

Felix Wehrle

Ingrid Cornelissen

A device for the treatment of substrates has a fluid container and two substrate transport devices positionable above the fluid container. Each substrate transport device is a hood for receiving multiple substrates. Each substrate transport device has at least one substrate support device having a first position for locking the substrates and a second position for releasing the substrates. The substrate transport devices are rigidly connected to one another and linearly movable for alternatingly positioning one of the substrate transport devices above the fluid container.

Device and method for the treatment of substrates in a fluid container

In a method for drying substrates, in particular, semiconductor wafers, an especially residue-free drying of the substrates results when, during removal of the substrates from a liquid, a meniscus of the liquid forming at the transition between the substrate surface and the liquid surface is heated. A device for performing the method is disclosed.

Method and device for drying substrates

In a device for the wet treatment of substrates (,) in a container (,), containing a treatment fluid (,), whereby the substrates (,) are introduced into the container (,) with a substrate carrier (,), an optimal alignment and centering of the substrates (,) will result within the container (,) upon lifting from the container (,) with the aid of a substrate receiving device (,) provided within the container (,).

Installation for wet-treating substrates

A device for the treatment of substrates has a fluid container filled with a treatment fluid and at least one substrate receiving device. A lifting device is provided for lifting and lowering the at least one substrate receiving device out of and into the treatment fluid. The lifting device is arranged laterally at the container and has parts that are positioned above the container and the treatment fluid. A vapor suction device with a suction channel is provided for exhaustion of vapors in an area in which parts of the at least one lifting device are located above the treatment fluid. In the area above the treatment fluid, a plate is provided having an opening to which the suction channel is connected.

Substrate treatment device

Method for drying substrates

A device for treating substrates includes a fluid container in which the substrates are contained during treatment. A nozzle system is connected to the sidewalls and/or bottom of the fluid container and includes a plurality of nozzles for introducing a fluid into the fluid container.

Device for treating substrates in a fluid container

A device for treatment of substrates in a fluid container includes a container containing a treatment fluid and a substrate transport device moveable into a position above the container. The substrate transport device has at least one substrate holding device for securing the substrates in a first position and releasing the substrates in a second position. A third position may be provided in which a first set of substrates is secured and a second set of substrates is released. The substrate holding device is preferably at least one rotatable securing rod.

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Elzach, Germany

Martin Weber