Markus Neumaier

Title: Inventor Markus Neumaier: Innovating Microlithography Technologies

Introduction

Markus Neumaier, an accomplished inventor based in Elchingen, Germany, has made significant strides in the field of microlithography. With a portfolio of five patents, Neumaier's work primarily focuses on advancing imaging devices utilized in projection exposure facilities.

Latest Patents

Neumaier's latest patent centers on an advanced imaging device designed for use in projection exposure machines tailored for microlithography. This device incorporates at least one optical element and a manipulator powered by a linear drive, allowing for precise manipulation of the optical element's position. The innovation features a linear drive with both a driven and nondriven subregion, which are movable relative to one another along a defined movement axis. These subregions are interconnected through functional elements exhibiting active axes, enhancing the efficacy of the imaging device.

Career Highlights

Throughout his career, Markus Neumaier has contributed his expertise to prominent companies, including Carl Zeiss SMT AG and Carl Zeiss SMT GmbH. His work in these organizations has not only bolstered his innovative capacity but has also led to the development of cutting-edge technologies within the field of optics and lithography.

Collaborations

Neumaier has collaborated with notable colleagues, including Wolfgang Hummel and Karl-Eugen Aubele. These partnerships have facilitated the exchange of ideas and propelled advancements in microlithography technologies, reflecting the importance of teamwork in driving innovation.

Conclusion

Markus Neumaier stands as a significant figure in the realm of microlithography, exhibiting a dedicated commitment to innovation through his patented inventions. His contributions continue to shape the future of imaging technology in projection exposure facilities, making a lasting impact on the industry.