Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Carl Zelss Smt Ag

Markus Neumaier

Hubert Holderer

Ulrich Weber

Alexander Kohl

Johannes Lippert

Wolfgang Hummel

Jochen Weber

Thorsten Rassel

Karl-Eugen Aubele

Erich Merz

Klaus Rief

Raoul Reiner

Juergen Fischer

Michael Muehlbeyer

Stefan Schoengart

Baerbel Trossbach

Stephan Back

Baerbel Schwaer

Michael Mühlbeyer

Jürgen Fischer

Stefan Schöngart

Bärbel Trossbach

Reiner Raoul

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

Imaging device in a projection exposure machine

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Growing community of inventors

Elchingen, Germany

Markus Neumaier