Marie T Conte

Title: Marie T Conte: Innovator in Microelectronic Photolithography

Introduction

Marie T Conte is a distinguished inventor based in Hillsboro, OR (US). She has made significant contributions to the field of microelectronic photolithography, showcasing her expertise through her innovative patent.

Latest Patents

Marie holds a patent titled "Measurement of a scattered light point spread function (PSF) for microelectronic photolithography." This patent involves measuring a scattered light point spread function for use in fabricating microelectronic and micromechanical devices using photolithography. In her method, a photosensitive layer of a microelectronic substrate is exposed through a test mask, which features a series of differently sized patterns surrounding a central monitor feature. The exposure of the photosensitive layer is measured for various patterns, and the results are compared to the pattern sizes. This comparison is then fitted to a function that is applied to correct photolithography mask layouts. Marie's innovative approach enhances the precision of microelectronic device fabrication.

Career Highlights

Marie T Conte is currently employed at Intel Corporation, where she continues to push the boundaries of technology and innovation. Her work at Intel has positioned her as a key player in the advancement of microelectronic technologies.

Collaborations

Throughout her career, Marie has collaborated with notable colleagues, including Allen B Gardiner and Seongtae Jeong. These collaborations have further enriched her work and contributed to the success of her projects.

Conclusion

Marie T Conte is a remarkable inventor whose contributions to microelectronic photolithography have made a lasting impact on the industry. Her innovative patent and work at Intel Corporation exemplify her dedication to advancing technology.