The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2010
Filed:
Jul. 21, 2006
Allen B. Gardiner, Portland, OR (US);
Seongtae Jeong, Portland, OR (US);
Marie T. Conte, Hillsboro, OR (US);
Manish Chandhok, Beaverton, OR (US);
Chris Kenyon, Portland, OR (US);
Allen B. Gardiner, Portland, OR (US);
Seongtae Jeong, Portland, OR (US);
Marie T. Conte, Hillsboro, OR (US);
Manish Chandhok, Beaverton, OR (US);
Chris Kenyon, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A scattered light point spread function is measured for use in fabricating microelectronic and micromechanical devices using photolithography. In one example, a photosensitive layer of a microelectronic substrate is exposed through a test mask, the test mask having a series of differently sized patterns, each pattern surrounding a central monitor feature, the differently sized patterns each being evenly distributed about its respective central monitor feature. An indication of the exposure of the photosensitive layer is measured for a plurality of the series of differently sized patterns. The exposure indication is compared to the pattern size. The comparison is fitted to a function and the function is applied in correcting photolithography mask layouts.