Chris Kenyon

Title: Chris Kenyon: Innovator in Microelectronic Photolithography

Introduction

Chris Kenyon is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of microelectronics, particularly in photolithography. With a total of 2 patents, his work has advanced the technology used in fabricating microelectronic and micromechanical devices.

Latest Patents

Kenyon's latest patents include the "Measurement of a scattered light point spread function (PSF) for microelectronic photolithography." This invention involves measuring a scattered light point spread function to enhance the fabrication process of microelectronic devices. The method includes exposing a photosensitive layer of a microelectronic substrate through a test mask with various patterns. The exposure is measured and compared to the pattern size, allowing for corrections in photolithography mask layouts. Another significant patent is "Detecting defects on photomasks," which focuses on identifying defects on photomasks by patterning alternating dice on a wafer under different process conditions. This innovative approach helps in highlighting and detecting defect areas effectively.

Career Highlights

Chris Kenyon is currently employed at Intel Corporation, where he continues to push the boundaries of technology in microelectronics. His work has been instrumental in improving the efficiency and accuracy of photolithography processes.

Collaborations

Throughout his career, Kenyon has collaborated with esteemed colleagues such as David N. Shykind and Richard E. Schenker. These collaborations have further enriched his contributions to the field.

Conclusion

Chris Kenyon's innovative work in microelectronic photolithography has made a lasting impact on the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.