Intel Corporation

Chris Kenyon

Manish Chandhok

Richard E Schenker

David N Shykind

Allen B Gardiner

Seongtae Jeong

Marie T Conte

A scattered light point spread function is measured for use in fabricating microelectronic and micromechanical devices using photolithography. In one example, a photosensitive layer of a microelectronic substrate is exposed through a test mask, the test mask having a series of differently sized patterns, each pattern surrounding a central monitor feature, the differently sized patterns each being evenly distributed about its respective central monitor feature. An indication of the exposure of the photosensitive layer is measured for a plurality of the series of differently sized patterns. The exposure indication is compared to the pattern size. The comparison is fitted to a function and the function is applied in correcting photolithography mask layouts.

Measurement of a scattered light point spread function (PSF) for microelectronic photolithography

Defects on at least one photomask are detected by patterning alternating dice on a wafer with different process conditions. The different conditions, such as a length of exposure time and an optical focus condition, are configured to highlight and detect defect areas.

Detecting defects on photomasks

Growing community of inventors

Portland, OR, United States of America

Chris Kenyon