Wako, Japan

Mari Koizumi


Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2011-2015

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Mari Koizumi

Introduction

Mari Koizumi is a prominent inventor based in Wako, Japan. She has made significant contributions to the field of materials science, particularly in the development of resist compositions and methods for pattern formation. With a total of four patents to her name, Koizumi's work has had a substantial impact on the industry.

Latest Patents

Koizumi's latest patents include a solvent developable negative resist composition and a resist pattern formation method. The solvent developing negative-tone resist composition features a base component that exhibits increased polarity and reduced solubility in an organic solvent under the action of an acid. This composition includes a resin component derived from an acrylate ester containing specific cyclic groups, along with an acid generator that produces a sulfonic acid upon exposure. Additionally, she has developed a method for producing a substrate with a metal nanostructure on its surface. This method involves forming a layer containing a block copolymer on a substrate, followed by phase separation and electrochemical reactions to deposit metal on the substrate's surface.

Career Highlights

Throughout her career, Mari Koizumi has worked with notable companies such as Tokyo Ohka Kogyo Co., Ltd. and Riken Corporation. Her expertise in materials science and innovative approaches have positioned her as a key figure in her field.

Collaborations

Koizumi has collaborated with esteemed colleagues, including Shigenori Fujikawa and Takahiro Senzaki. These partnerships have further enhanced her research and development efforts.

Conclusion

Mari Koizumi's contributions to the field of materials science through her innovative patents and collaborations highlight her as a leading inventor in her domain. Her work continues to influence advancements in resist compositions and pattern formation methods.

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