Tokyo Ohka Kogyo Co., Ltd.

Riken Corporation

Mari Koizumi

Shigenori Fujikawa

Ken Miyagi

Takahiro Senzaki

Takahiro Dazai

Harumi Hayakawa

Hideo Hada

Toyoki Kunitake

Sanae Furuya

Hiromi Takaemoto

A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure.

Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer

A method of producing a substrate provided with a metal nanostructure on the surface thereof, including: forming a layer containing a block copolymer having a plurality of polymers bonded on a surface of a substrate, and subjecting the layer to phase separation, selectively removing a phase of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer to expose part of the surface of the substrate, and allowing a metal ion to come into contact with the exposed surface of the substrate to effect an electrochemical reaction between the surface of the substrate and the metal ion, thereby depositing a metal on the surface of the substrate; and a substrate provided with a metal nanostructure on the surface thereof produced by the same method.

Substrate provided with metal nanostructure on surface thereof and method of producing the same

An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (), thereby forming a layer () composed of the undercoat agent, step (2) forming a layer () containing a block copolymer having a plurality of polymers bonded on the surface of the layer () composed of the undercoat agent, and subjecting the layer () containing the block copolymer to phase separation, and step (3) selectively removing a phase () of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer () containing the block copolymer.

Primer and pattern forming method for layer including block copolymer

A method of manufacturing a structure, including forming a composite film composed of a coating film and an organic or inorganic film on top of a substrate by forming the coating film on the surface of a template provided on top of the substrate; forming the organic or inorganic film on the surface of the coating film, and removing a portion of the organic or inorganic film and a portion of the coating film; forming a second coating film on the surface of the composite film; forming an organic coating film on the substrate that covers the second coating film; removing a portion of the second coating film; and forming a structure composed of a metal or metal oxide later on the substrate by removing all residues left on the substrate except for the coating film and the second coating film.

Method for manufacturing a structure

Growing community of inventors

Wako, Japan

Mari Koizumi