Nagoya, Japan

Manabu Tomisaka


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2006-2025

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7 patents (USPTO):Explore Patents

Title: The Innovations of Manabu Tomisaka

Introduction

Manabu Tomisaka is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on surface processing methods and apparatuses that enhance the performance of semiconductor devices.

Latest Patents

One of his latest patents is a surface processing apparatus and surface processing method for SiC substrate. This invention utilizes anodization to improve the surface processing of silicon carbide (SiC) substrates. The apparatus includes a surface processing pad and a power supply device, where the pad features a grinding wheel layer that faces the workpiece surface. The power supply device is designed to pass a pulsed current for anodizing the workpiece surface in the presence of an electrolyte.

Another notable patent involves a semiconductor device and a method of patterning a resin insulation layer on the substrate. In this method, an electrode layer is formed on a semiconductor substrate, followed by the application of a resin insulation layer. A tapered hole is created in the insulation layer using a specialized tool bit, allowing for precise manufacturing of semiconductor devices.

Career Highlights

Manabu Tomisaka is currently employed at Denso Corporation, a leading company in the automotive industry. His work at Denso has allowed him to apply his innovative ideas in practical applications, contributing to advancements in semiconductor technology.

Collaborations

Throughout his career, Tomisaka has collaborated with notable colleagues such as Hiroaki Tanaka and Hisatoshi Kojima. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Manabu Tomisaka's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the future of the industry, making significant strides in the field of surface processing and semiconductor devices.

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