Tokyo, Japan

Manabu Hoshino

USPTO Granted Patents = 24 


 

Average Co-Inventor Count = 1.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Futtsu, JP (2012)
  • Kimitsu, JP (2017)
  • Tokyo, JP (2011 - 2024)

Company Filing History:


Years Active: 2011-2025

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24 patents (USPTO):Explore Patents

Title: Manabu Hoshino: Innovator in EUV Lithography

Introduction

Manabu Hoshino is an accomplished inventor based in Tokyo, Japan, who has significantly contributed to the field of lithography through his innovative research and development efforts. With a remarkable portfolio of 23 patents, Hoshino is recognized for his advancements in positive resist compositions, particularly for extreme ultraviolet (EUV) lithography applications.

Latest Patents

Among his latest patents, Hoshino focuses on a positive resist composition for EUV lithography and a method of forming resist patterns. This positive resist composition is engineered to produce a resist film with high sensitivity to extreme ultraviolet light. The formulation includes a solvent and a copolymer, incorporating various monomer units specified by general formulas. His inventive approach addresses the need for materials that enhance pattern fidelity in semiconductor manufacturing. Additionally, he developed a resist composition aimed at improving coatability on substrates during spin coating, ensuring better adherence and pattern formation.

Career Highlights

Hoshino's career is marked by his tenure at prominent companies, including Zeon Corporation and Nippon Steel Corporation. His expertise in materials science and lithography technologies has made him a pivotal figure in developing advanced solutions for the semiconductor industry. Over the years, he has honed his skills, contributing to various projects that push the boundaries of current lithographic techniques.

Collaborations

Throughout his career, Hoshino has had the opportunity to collaborate with esteemed coworkers like Tetsuya Namegawa and Shinichi Omiya. These partnerships have fostered a vibrant exchange of ideas, leading to innovative solutions and further advancements in the field of lithography.

Conclusion

Manabu Hoshino stands out as a leading inventor in the realm of EUV lithography, with a robust portfolio of patents attesting to his expertise and contributions. His work reflects the ongoing evolution of semiconductor technology, driven by innovation and collaboration within the industry. As the demand for advanced lithographic materials continues to grow, Hoshino’s contributions will undoubtedly play a vital role in shaping the future of this critical field.

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