The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
Jan. 17, 2019
Applicant:
Zeon Corporation, Tokyo, JP;
Inventor:
Manabu Hoshino, Tokyo, JP;
Assignee:
ZEON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/027 (2006.01); C08F 212/08 (2006.01); C08F 220/22 (2006.01); C08F 265/06 (2006.01); G03F 7/033 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C08F 212/08 (2013.01); C08F 220/22 (2013.01); C08F 265/06 (2013.01); G03F 7/033 (2013.01); G03F 7/039 (2013.01);
Abstract
Provided are a resist composition that can improve coatability (coating film formability) with respect to a substrate in spin coating and close adherence of a resist film and that can form a good pattern, and a resist film in which a good pattern is formed. The resist composition contains a polymer, a solvent, and an aromatic vinyl monomer, and has a content of the aromatic vinyl monomer relative to the polymer of not less than 10 mass ppm and not more than 30,000 mass ppm.
Hoshino, Manabu. (2024). Resist composition and resist film (U.S. Patent No. 11960207). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11960207
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile