Phoenix, AZ, United States of America

Malcolm Grief

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 6.7

ph-index = 2

Forward Citations = 48(Granted Patents)


Location History:

  • Phoenix, AZ (US) (2014 - 2020)
  • Tempe, AZ (US) (2020)

Company Filing History:


Years Active: 2014-2020

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7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Malcolm Grief

Introduction

Malcolm Grief is a prominent inventor based in Phoenix, AZ, known for his significant contributions to the field of chemical mechanical polishing (CMP). With a total of 7 patents to his name, Grief has developed innovative solutions that enhance the efficiency and effectiveness of polishing processes in various applications.

Latest Patents

One of Grief's latest patents focuses on the chemical mechanical polishing of cobalt-containing substrates. This invention provides compositions, methods, and systems designed to polish cobalt or cobalt-containing substrates effectively. The CMP compositions include α-alanine, abrasive particles, a salt of phosphate, a corrosion inhibitor, an oxidizer, and water. These compositions are notable for their high removal rate of cobalt, as well as their exceptional selectivity of cobalt film versus dielectric films, such as TEOS and low-k films.

Another significant patent by Grief involves composite abrasive particles for chemical mechanical planarization. This invention presents CMP polishing compositions that utilize composite particles, such as ceria-coated silica particles. These compositions are designed to minimize dishing and defects while achieving a high removal rate for polishing oxide films. The performance of these CMP polishing compositions has been outstanding, particularly when used with soft polishing pads.

Career Highlights

Throughout his career, Malcolm Grief has worked with notable companies, including Versum Materials and Medtronic. His expertise in chemical mechanical polishing has made him a valuable asset in the industry, contributing to advancements in polishing technologies.

Collaborations

Grief has collaborated with esteemed colleagues, including Xiaobo Shi and Mark Leonard O'Neill. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in the field of CMP.

Conclusion

Malcolm Grief's contributions to the field of chemical mechanical polishing are significant and impactful. His innovative patents and collaborations have advanced the technology, making him a noteworthy figure in the industry.

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