Kawasaki, Japan

Makiko Irie



Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 72(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2009 - 2010)
  • Kawasaki, JP (2010 - 2019)

Company Filing History:


Years Active: 2009-2019

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20 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Makiko Irie

Introduction: Makiko Irie is a prominent inventor based in Kawasaki, Japan, known for her significant contributions to the field of photosensitive resin compositions. With 20 patents to her name, her innovative work is at the forefront of technological advancements in resist pattern formation.

Latest Patents: Among her latest patents, Irie has developed a chemically amplified positive-type photosensitive resin composition that excels in forming intricate resist patterns. This composition can create a resist pattern with a well-defined rectangular sectional shape. Her inventive methods also encompass the manufacturing of substrates using this composition, which leads to the production of plated articles. Additionally, she has created a resist composition that includes a base component with variable solubility in alkaline developing solutions, enhanced by an acid generator that is activated upon exposure to light.

Career Highlights: Irie has a robust career characterized by her tenure at Tokyo Ohka Kogyo Co., Ltd. and Tokyo Ohka Co., Ltd. Her focus on chemically amplified resist technologies has garnered her recognition among peers and professionals alike.

Collaborations: Throughout her career, Makiko Irie has collaborated with notable colleagues, including Takeshi Iwai and Tomoyuki Hirano. Their teamwork has contributed to advancements in the field and further established Irie’s reputation as an innovator.

Conclusion: Makiko Irie continues to impact the industry with her inventive spirit and expertise in photosensitive resin compositions. Her research and innovations pave the way for advancements in resist pattern technology, making her a valuable figure in the field of invention and patents.

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