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For the Inventor, By the Inventor

Kawasaki, Japan

Makiko Irie

This inventor holds 20 USPTO granted patents and 5 published patent applications and 1 EPO patent, primarily in Photosensitive Resins. Top assignees: Tokyo Ohka Kogyo Co., Ltd., Tokyo Ohka Co., Ltd.. Active years: 2009-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Makiko Irie. Retrieved from https://idiyas.com/inventor/makiko-irie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 90.0


Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 72(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2009 - 2010)
  • Kawasaki, JP (2010 - 2019)

Company Filing History:

goldMedal19 out of 1,236 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents
silverMedal1 out of 2 
 
Tokyo Ohka Co., Ltd.
 patents

Years Active: 2009-2019

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Areas of Expertise:
Photosensitive Resin
Resist Composition
Pattern Formation
Immersion Lithography
Chemically Amplified
Polymeric Compound
Thick-Film Application
Positive Resist
20 patents (USPTO):Explore Patents
1. 10261415 - Chemically amplified positive-type photosensitive resin composition (2019-04-16),
2. 9618842 - Resist composition and method of forming resist pattern (2017-04-11),
3. 9448478 - Chemically amplified positive-type photosensitive resin composition for thick-film application (2016-09-20),
4. 9372403 - Chemically amplified photosensitive resin composition and method for producing resist pattern using the same (2016-06-21),
5. 9323152 - Chemically amplified positive-type photosensitive resin composition and method for producing resist pattern using the same (2016-04-26),
6. 8916332 - Resist composition, method of forming resist pattern, and polymeric compound (2014-12-23),
7. 8795947 - Resist composition and method of forming resist pattern (2014-08-05),
8. 8574813 - Resist composition for immersion exposure and method of forming resist pattern (2013-11-05),
9. 8394569 - Resist composition for immersion lithography and method for forming resist pattern (2013-03-12),
10. 8278022 - Positive resist composition and method of forming resist pattern (2012-10-02),
11. 8263307 - Positive resist composition and method of forming resist pattern (2012-09-11),
12. 8192914 - Resist composition for immersion exposure and method of forming resist pattern (2012-06-05),
13. 8187789 - Positive resist composition and method of forming resist pattern (2012-05-29),
14. 8029968 - Positive resist composition and method for resist pattern formation (2011-10-04),
15. 8021824 - Polymer compound, resist composition and method of forming resist pattern (2011-09-20),

Title: Innovator Spotlight: Makiko Irie

Introduction: Makiko Irie is a prominent inventor based in Kawasaki, Japan, known for her significant contributions to the field of photosensitive resin compositions. With 20 patents to her name, her innovative work is at the forefront of technological advancements in resist pattern formation.

Latest Patents: Among her latest patents, Irie has developed a chemically amplified positive-type photosensitive resin composition that excels in forming intricate resist patterns. This composition can create a resist pattern with a well-defined rectangular sectional shape. Her inventive methods also encompass the manufacturing of substrates using this composition, which leads to the production of plated articles. Additionally, she has created a resist composition that includes a base component with variable solubility in alkaline developing solutions, enhanced by an acid generator that is activated upon exposure to light.

Career Highlights: Irie has a robust career characterized by her tenure at Tokyo Ohka Kogyo Co., Ltd. and Tokyo Ohka Co., Ltd. Her focus on chemically amplified resist technologies has garnered her recognition among peers and professionals alike.

Collaborations: Throughout her career, Makiko Irie has collaborated with notable colleagues, including Takeshi Iwai and Tomoyuki Hirano. Their teamwork has contributed to advancements in the field and further established Irie’s reputation as an innovator.

Conclusion: Makiko Irie continues to impact the industry with her inventive spirit and expertise in photosensitive resin compositions. Her research and innovations pave the way for advancements in resist pattern technology, making her a valuable figure in the field of invention and patents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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