Ma Fatima Seijo is a prominent inventor based in Hayward, California, known for her significant contributions to the field of semiconductor cleaning solutions. With a total of 11 patents to her name, she has developed innovative formulations that address the challenges faced in semiconductor manufacturing.

Latest Patents

Among her latest patents is an aqueous cleaning composition containing a copper-specific corrosion inhibitor designed for cleaning inorganic residues on semiconductor substrates. This formulation includes 1-35% weight fluoride source, 20-60% weight organic amines, 0.1-40% weight nitrogenous components, 20-50% weight water, and 0-21% weight metal chelating agents. These formulations are particularly useful for removing residues from wafers following a resist plasma ashing step, especially those containing delicate copper interconnecting structures. Another notable patent features a similar aqueous cleaning composition, which includes 1-21% weight fluoride source, 20-55% weight organic amines, 0.5-40% weight nitrogenous components, 23-50% weight water, and 0-21% weight metal chelating agents.

Career Highlights

Ma Fatima Seijo has worked with notable companies in the semiconductor industry, including Advanced Technology Materials, Inc. and Advanced Technologies Materials, Inc. Her work has significantly impacted the efficiency and effectiveness of cleaning processes in semiconductor manufacturing.

Collaborations

Throughout her career, she has collaborated with esteemed colleagues such as William A Wojtczak and David Daniel Bernhard, contributing to advancements in her field.

Conclusion

Ma Fatima Seijo's innovative work in developing cleaning solutions for semiconductor substrates showcases her expertise and dedication to improving manufacturing processes. Her contributions continue to influence the semiconductor industry positively.

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