The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Sep. 17, 2001
William A. Wojtczak, Austin, TX (US);
Ma. Fatima Seijo, Hayward, CA (US);
Thomas J. Kloffenstein, Morgan Hill, CA (US);
Stephen A. Fine, Legal Representative, Peabody, MA (US);
William A. Wojtczak, Austin, TX (US);
Ma. Fatima Seijo, Hayward, CA (US);
Thomas J. Kloffenstein, Morgan Hill, CA (US);
Stephen A. Fine, legal representative, Peabody, MA (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
A semiconductor wafer cleaning formulation for use in post plasma ashing semiconductor fabrication comprising at least one organic chelating agent and at least one polar solvent, wherein the chelating agent and polar solvent are in sufficient amounts to effectively remove inorganic compound residue from a semiconductor wafer. Preferably, the chelating agent is selected from the group consisting of 2,4-Pentanedione, Malonic acid, Oxalic acid, p-Toluenesulfonic acid, and Trifluoroacetic acid; and the polar solvent is selected from the group consisting of Water, Ethylene glycol, N-Methylpyrrolidone (NMP), Gamma butyrolactone (BLO), Cyclohexylpyrrolidone (CHP), Sulfolane, 1,4-Butanediol, and Butyl carbitol.