The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Mar. 25, 2002
Applicant:
Inventors:
Ma. Fatima Seijo, Hayward, CA (US);
William A. Wojtczak, Austin, TX (US);
David Bernhard, Newton, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
David Minsek, Pleasantville, NY (US);
Assignee:
Advanced Technology Materials, Inc., Danbury, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/42 ; C11D 9/00 ; C11D 9/02 ; C23G 1/02 ; C23G 1/00 ; C03C 2/300 ;
U.S. Cl.
CPC ...
G03F 7/42 ; C11D 9/00 ; C11D 9/02 ; C23G 1/02 ; C23G 1/00 ; C03C 2/300 ;
Abstract
A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation comprising a buffering system a polar organic solvent, and a fluoride source.