Lynn David Bollinger

Title: Lynn David Bollinger: Innovator in Polymer Removal Technologies

Introduction

Lynn David Bollinger is a notable inventor based in Ridgefield, CT (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of polymer removal technologies. With a total of 7 patents to his name, Bollinger's work has advanced the efficiency and effectiveness of processes used in the production of microstructures.

Latest Patents

Bollinger's latest patents include innovative systems designed for the controlled and rapid removal of polymers from high aspect ratio holes. One of his patents describes an atmospheric process and system that generates an intense hot gas stream to etch polymers on substrates used in semiconductor and MEMS device manufacturing. This etching process is particularly beneficial for removing polymers from high aspect ratio holes, including trenches, without causing surface damage. Another patent focuses on a hot arc-type plasma generating system that effectively etches polymers from high aspect ratio holes, with ratios greater than 10 to 1 and even exceeding 50 to 1.

Career Highlights

Throughout his career, Bollinger has worked with several prominent companies, including Jetek, Inc. and Hughes Aircraft Company. His experience in these organizations has contributed to his expertise in developing advanced technologies for the semiconductor industry.

Collaborations

Bollinger has collaborated with various professionals in his field, including Iskander Tokmouline and Michael P Power. These collaborations have further enriched his work and have led to innovative solutions in polymer removal processes.

Conclusion

Lynn David Bollinger's contributions to the field of semiconductor manufacturing through his innovative patents and career experiences highlight his role as a key inventor in polymer removal technologies. His work continues to influence the industry and improve manufacturing processes.