The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2005
Filed:
Feb. 06, 2003
Applicants:
Lynn David Bollinger, Ridgefield, CT (US);
Iskander Tokmouline, New Fairfield, CT (US);
Inventors:
Lynn David Bollinger, Ridgefield, CT (US);
Iskander Tokmouline, New Fairfield, CT (US);
Assignee:
Jetek, Inc., Ridgefield, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/47 ; H01L021/465 ;
U.S. Cl.
CPC ...
Abstract
A hot arc-type plasma generating system is described to etch a polymer on a substrate used in the manufacture of semiconductor devices. The etching process is particularly useful to remove a polymer from high aspect ratio holes, that can include trenches, greater than about 10 to 1 and even greater than 50 to 1.