The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2002
Filed:
Oct. 12, 2000
Lynn David Bollinger, Ridgefield, CT (US);
Iskander Tokmouline, New Fairfield, CT (US);
Jetek, Inc., Ridgefield, CT (US);
Abstract
In the method and apparatus of this invention a wafer for manufacturing semiconductor devices is held by a vortex-type substrate holder against a moveable frame during processing. Motion of the wafer is controlled with movement of the frame. The frame is shaped to provide a sealed chamber through which gas that is used to create the vortices is also re-captured. With such sealed chamber a higher heat conducting but more expensive gas can be recycled and used for the vortex holder and cooling of the wafer. In another technique of this invention, damage of the wafer edges from impacts with position limiters is avoided by inserting a small physical off-set of the center of mass of the wafer relative to that of the frame used to rotate the wafer. This prevents sliding of the wafer within the holder. In another feature of the invention end effects during treatment of the wafer are avoided by providing an extension around the wafer. The extension assures that the treating gas stream provides the same treatment to the edge of the wafer as in its center.