Miaoli, Taiwan

Lin-Jung Wu


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 52(Granted Patents)


Location History:

  • Miaoli, TW (2014 - 2019)
  • Miaoli County, TW (2016 - 2019)

Company Filing History:


Years Active: 2014-2019

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8 patents (USPTO):

Title: Lin-Jung Wu: Innovator in Semiconductor Technology

Introduction

Lin-Jung Wu is a prominent inventor based in Miaoli, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on improving manufacturing processes and enhancing the reliability of semiconductor devices.

Latest Patents

Among his latest patents is the "CVD Metal Seed Layer," which presents an improved method for forming interconnection layers. This method aims to reduce voids and enhance reliability in semiconductor devices. The process involves forming a dielectric layer over a semiconductor substrate, followed by the application of a metal seed layer using a chemical vapor deposition (CVD) process. This innovation allows for high aspect ratio openings in the dielectric layer to be filled without voids or pinch-off.

Another notable patent is the "Atomic Layer Deposition Method for Manufacturing Semiconductor Structure." This method includes several steps, such as hydrogenizing the surface of a semiconductor substrate and supplying a precursor and reactant to the surface. This atomic layer deposition (ALD) method is crucial for advancing semiconductor manufacturing techniques.

Career Highlights

Lin-Jung Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and contribute to the semiconductor industry. His expertise and inventions have played a vital role in enhancing the performance and reliability of semiconductor devices.

Collaborations

He has collaborated with notable colleagues, including Chi-Ming Yang and Su-Horng Lin, to further advance research and development in semiconductor technologies.

Conclusion

Lin-Jung Wu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the future of semiconductor manufacturing and device reliability.

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