This inventor holds 3 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2010-2018.
Company Filing History:
Years Active: 2010-2018
Title: Innovator Lin-Hung Shiu: Advancements in Lithography Technology
Introduction
Lin-Hung Shiu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography technology, securing a total of three patents that highlight his innovative approach and technical expertise.
Latest Patents
Among his latest inventions, Lin-Hung Shiu has developed a lithography method that includes forming a surface modification layer on a substrate. This layer features a hydrophilic top surface, enhancing the coating process of a photoresist layer and facilitating the formation of a patterned photoresist layer. Another remarkable patented invention is a hood for immersion lithography, which comprises an imaging lens module and a substrate table designed to hold a substrate. This lithography apparatus is equipped with a fluid retaining module to maintain fluid between the imaging lens and the substrate, alongside a sophisticated heating element designed to optimize performance.
Career Highlights
Lin-Hung Shiu is currently associated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), one of the leading semiconductor manufacturing companies globally. His work focuses on advancing lithography techniques that are crucial in the production of high-precision semiconductor devices.
Collaborations
Throughout his career, Lin-Hung Shiu has collaborated with esteemed colleagues, including Fu-Jye Liang and Chun-Kuang Chen. Their combined efforts have spurred innovation in the field, facilitating the development of cutting-edge technologies.
Conclusion
Lin-Hung Shiu's contributions to lithography technology underscore his role as a key inventor in the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes, and through collaboration with talented professionals, he continues to push the boundaries of innovation in Hsinchu, Taiwan.