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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10101659 B1

PDFFull Text
Date of Patent:
Oct. 16, 2018

Filed:

Nov. 18, 2016

Lithography method with surface modification layer

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Shu-Fang Chen, Hsinchu County, TW;

Hung-Chung Chien, Chiayi County, TW;

Lin-Hung Shiu, Hsinchu, TW;

Hung-Chang Hsieh, Hsin-Chu, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD, Hsin-Chu, TW;

Attorney:

Haynes and Boone, LLP

Primary Examiner:

Kathleen Duda

Int. Cl.
CPC ...
G03F 7/09 (2006.01); H01L 21/027 (2006.01); H01L 21/02 (2006.01); H01L 21/266 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); H01L 21/0226 (2013.01); H01L 21/0271 (2013.01); H01L 21/0276 (2013.01); H01L 21/02118 (2013.01); H01L 21/02126 (2013.01); H01L 21/02343 (2013.01); H01L 21/266 (2013.01); H01L 21/02266 (2013.01); H01L 21/02282 (2013.01);
Abstract

A lithography method is provided in accordance with some embodiments. The lithography method includes forming a surface modification layer on a substrate, the surface modification layer including a hydrophilic top surface; coating a photoresist layer on the surface modification layer; and developing the photoresist layer, thereby forming a patterned photoresist layer.

Find Patent Forward Citations

Chen, Shu-Fang. (2018). Lithography method with surface modification layer (U.S. Patent No. 10101659). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10101659

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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