The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Jul. 31, 2006
Fu-jye Liang, Kaohsiung, TW;
Lin-hung Shiu, Hsinchu, TW;
Chun-kuang Chen, Hsinchu, TW;
Tsai-sheng Gau, Hsin-Chu, TW;
Burn Jeng Lin, Hsin-Chu, TW;
Fu-Jye Liang, Kaohsiung, TW;
Lin-Hung Shiu, Hsinchu, TW;
Chun-Kuang Chen, Hsinchu, TW;
Tsai-Sheng Gau, Hsin-Chu, TW;
Burn Jeng Lin, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A lithography process to pattern a plurality of fields on a substrate is disclosed. The process includes scanning a first field along a first direction using a radiation beam. Thereafter, the processes steps to a second field adjacent the first field and located behind the first field when the first and second fields are viewed along the first direction. The second field is then scanned along the first direction using the radiation beam.