Liliya Krivulina

Title: Liliya Krivulina: Innovator in Semiconductor Processing Technology

Introduction

Liliya Krivulina is a prominent inventor based in Santa Clara, CA (US). She has made significant contributions to the field of semiconductor processing, holding a total of 6 patents. Her innovative work has advanced the technology used in various semiconductor applications.

Latest Patents

Among her latest patents is the "Interlock System for Processing Chamber Exhaust Assembly." This exemplary semiconductor processing system includes a gas source connected to multiple processing chambers. Each chamber features an exhaust assembly with a foreline and a pump, along with an abatement system linked to each pump. The system also incorporates a dilution gas source and a mass flow controller, enhancing the efficiency of gas flow management based on temperature sensor readings.

Another notable patent is the "Loadlock Integrated Bevel Etcher System." This invention describes a bevel etch apparatus within a loadlock bevel etch chamber. The mask assembly in this system delivers a gas flow that controls bevel etching without the need for a shadow frame, thereby reducing edge exclusion and increasing product yield.

Career Highlights

Liliya Krivulina is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work focuses on developing advanced technologies that improve semiconductor manufacturing processes.

Collaborations

Throughout her career, Liliya has collaborated with talented professionals, including Juan Carlos Rocha-Alvarez and Saptarshi Basu. These collaborations have contributed to her innovative projects and the successful development of her patents.

Conclusion

Liliya Krivulina is a remarkable inventor whose contributions to semiconductor processing technology have made a significant impact in the industry. Her patents reflect her dedication to innovation and excellence in her field.