The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Mar. 05, 2024
Applied Materials, Inc., Santa Clara, CA (US);
Nuwan S. Dodampegamage, Santa Clara, CA (US);
Bryan Liao, Sunnyvale, CA (US);
Liliya I. Krivulina, Santa Clara, CA (US);
Dmitry A. Dzilno, Sunnyvale, CA (US);
Uwe P. Haller, San Jose, CA (US);
Jian Li, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A semiconductor processing chamber may include an electrostatic chuck (ESC) with one or more electrodes that may deliver a chucking voltage to the pedestal. The pedestal can support a substrate while a semiconductor process occurs in the semiconductor processing chamber. The one or more electrodes may be coupled to an ESC power source that may provide the chucking voltage and may have an adjustable current limit. The adjustable current limit may be set based on certain characteristics of a semiconductor process that may be occurring in the semiconductor processing chamber. The ESC power source can prevent the supplied current from exceeding the adjustable current limit, thereby preventing current arcs from discharging into the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile